(a) Unit optimization process with a hybrid continuous-discrete PSO algorithm. The particulars of the yellow and green boxes in the optimization are elaborated in (b) and (c), respectively. (b) The ...
Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...
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